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Notice2026-20092

Notice of Intent To Grant a Joint Ownership Agreement With an Exclusive Patent License

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Metadata and text below are from the Federal Register, a public-domain U.S. government work. Always verify the official published version before relying on it for any legal matter.

Published
October 1, 2026

Issuing agencies

Defense DepartmentAir Force Department

Abstract

Pursuant to the Bayh-Dole Act and implementing regulations, the Department of the Air Force hereby gives notice of its intent to grant a joint ownership agreement with an Exclusive Patent License to Wright State University having a place of business at 3640 Colonel Glenn Highway, Dayton, Ohio 45435.

Full Text

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<title>Federal Register, Volume 91 Issue 189 (Thursday, October 1, 2026)</title>
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[Federal Register Volume 91, Number 189 (Thursday, October 1, 2026)]
[Notices]
[Pages 62502-62503]
From the Federal Register Online via the Government Publishing Office [<a href="http://www.gpo.gov">www.gpo.gov</a>]
[FR Doc No: 2026-20092]


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DEPARTMENT OF DEFENSE

Department of the Air Force


Notice of Intent To Grant a Joint Ownership Agreement With an 
Exclusive Patent License

AGENCY: Department of the Air Force, Department of Defense.

ACTION: Notice of intent.

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SUMMARY: Pursuant to the Bayh-Dole Act and implementing regulations, 
the Department of the Air Force hereby gives notice of its intent to 
grant a joint ownership agreement with an Exclusive Patent License to 
Wright State University having a place of business at 3640 Colonel 
Glenn Highway, Dayton, Ohio 45435.

DATES: Written objections must be filed no later than fifteen (15) 
calendar days after the date of publication of this Notice.

ADDRESSES: Submit written objections to Robert Barnes, Air Force 
Research Laboratory, Information & Spectrum Warfare Directorate, 2241 
Avionics Circle, Bldg. 620, Wright Patterson Wright Patterson AFB, Ohio 
45433; Phone: (937) 713-8511; or Email: <a href="/cdn-cgi/l/email-protection#49080f1b05671b1067061b1d08093c3a67282f67242025"><span class="__cf_email__" data-cfemail="aeefe8fce280fcf780e1fcfaefeedbdd80cfc880c3c7c2">[email&#160;protected]</span></a> or 
<a href="/cdn-cgi/l/email-protection#8bd9e4e9eef9ffa5c9eaf9e5eef8a5b8bda5e8fff9cbfef8a5eaeda5e6e2e7"><span class="__cf_email__" data-cfemail="de8cb1bcbbacaaf09cbfacb0bbadf0ede8f0bdaaac9eabadf0bfb8f0b3b7b2">[email&#160;protected]</span></a>. Include Docket No. AFD2461/50370-0019-
01 in the subject line of the message.

FOR FURTHER INFORMATION CONTACT: Robert Barnes, Air Force Research 
Laboratory, Information & Spectrum Warfare Directorate, 2241 Avionics 
Circle, Bldg. 620, Wright-Patterson AFB, OH 45433; Phone: (937) 713-
8511; or Email: <a href="/cdn-cgi/l/email-protection#135255415f3d414a3d5c4147525366603d72753d7e7a7f"><span class="__cf_email__" data-cfemail="f6b7b0a4bad8a4afd8b9a4a2b7b68385d89790d89b9f9a">[email&#160;protected]</span></a> or 
<a href="/cdn-cgi/l/email-protection" class="__cf_email__" data-cfemail="b4e6dbd6d1c6c09af6d5c6dad1c79a87829ad7c0c69af4c1c79ad5d29ad9ddd8">[email&#160;protected]</a>.

SUPPLEMENTARY INFORMATION: 
    Abstract of patent application(s):
    The present invention relates to diffusion barriers for metal/
dielectric interfaces, as well as methods of making and using same. 
Diffusion barriers for metal/dielectric interfaces having the

[[Page 62503]]

required abruptness to allow operation above 500 [deg]C and a process. 
The process is compatible for MOS device process technology, where the 
devices are either processed or operated at HT, therefore, requires a 
diffusion barrier that can be deposited via a physical vapor deposition 
process and can also ensure an abrupt metal/dielectric interface with 
negligible diffusion of metals into the dielectric and dielectric into 
the metal.
    Intellectual property:
    U.S. Application No. US Application Serial Number 19/056,139 
[Attorney Docket AFD2461/50370-0019-01] filed 18 February 2025, 
claiming the benefit of Provisional Application Serial Number 63/
554,974, filed 17 February 2024, and entitled Diffusion Barrier for 
Metal/Dielectric Interface.
    The Department of the Air Force may grant the prospective license 
unless a timely objection is received that sufficiently shows the grant 
of the license would be inconsistent with the Bayh-Dole Act or 
implementing regulations. A competing application for a patent license 
agreement, completed in compliance with 37 CFR 404.8 and received by 
the Air Force within the period for timely objections, will be treated 
as an objection and may be considered as an alternative to the proposed 
license.

(Authority: 35 U.S.C. 209; 37 CFR 404.)

Crystle C. Poge,
Air Force Federal Register Liaison Officer.
[FR Doc. 2026-20092 Filed 9-30-26; 8:45 am]
BILLING CODE 3911-44-P


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Indexed from Federal Register on October 1, 2026.

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