Notice of Intent To Grant a Partially Exclusive Patent License
Primary source
Metadata and text below are from the Federal Register, a public-domain U.S. government work. Always verify the official published version before relying on it for any legal matter.
Issuing agencies
Abstract
Pursuant to the Bayh-Dole Act and implementing regulations, the Department of the Air Force hereby gives notice of its intent to grant a partially exclusive (the field to include imaging and communication using infrared wavelengths) patent license to Ravee Optics Inc., a Delaware corporation having a place of business at 406 Greenmount Blvd., Oakwood, OH 45419.
Full Text
<html>
<head>
<title>Federal Register, Volume 91 Issue 28 (Wednesday, February 11, 2026)</title>
</head>
<body><pre>
[Federal Register Volume 91, Number 28 (Wednesday, February 11, 2026)]
[Notices]
[Page 6203]
From the Federal Register Online via the Government Publishing Office [<a href="http://www.gpo.gov">www.gpo.gov</a>]
[FR Doc No: 2026-02686]
-----------------------------------------------------------------------
DEPARTMENT OF DEFENSE
Department of the Air Force
Notice of Intent To Grant a Partially Exclusive Patent License
AGENCY: Department of the Air Force, Department of Defense.
ACTION: Notice of intent.
-----------------------------------------------------------------------
SUMMARY: Pursuant to the Bayh-Dole Act and implementing regulations,
the Department of the Air Force hereby gives notice of its intent to
grant a partially exclusive (the field to include imaging and
communication using infrared wavelengths) patent license to Ravee
Optics Inc., a Delaware corporation having a place of business at 406
Greenmount Blvd., Oakwood, OH 45419.
DATES: Written objections must be filed no later than fifteen (15)
calendar days after the date of publication of this notice.
ADDRESSES: Submit written objections to John DePinto, Air Force
Research Laboratory, Manufacturing Directorate, Attn: Office of
Technology Transfer & Applications, 2977 Hobson Way, Bldg. 653, Room
105; Phone: (937) 255-3637; or Email: <a href="/cdn-cgi/l/email-protection#28494e5a44065a50065c1a685d5b06494e06454144"><span class="__cf_email__" data-cfemail="39585f4b55174b41174d0b794c4a17585f17545055">[email protected]</span></a>. Include
Docket No. 25-0005890-AFRL/RX in the subject line of the message.
FOR FURTHER INFORMATION CONTACT: John DePinto, Air Force Research
Laboratory, Manufacturing Directorate, Attn: Office of Technology
Transfer & Applications, 2977 Hobson Way, Bldg. 653, Room 105; Phone:
(937) 255-3637; or Email: <a href="/cdn-cgi/l/email-protection#95f4f3e7f9bbe7edbbe1a7d5e0e6bbf4f3bbf8fcf9"><span class="__cf_email__" data-cfemail="3c5d5a4e50124e4412480e7c494f125d5a12515550">[email protected]</span></a>.
SUPPLEMENTARY INFORMATION:
Abstract of Patent Application(s)
A wafer-scale metamaterial structure and a method for forming is
provided. The metamaterial structure has a number of reticles each
having meta-atoms in which a number of dual-function meta-atoms form an
alignment mark at an interior zone of the reticle. The alignment mark
of the reticle is configured to align with a corresponding alignment
mark at an interior zone of another reticle at a lithographic divide
between the reticles that together form a metamaterial component.
Misalignment between dual-function meta-atoms of the alignment mark and
the dual-function meta-atoms of the corresponding alignment mark
creates a plurality of malformed meta-atoms at the lithographic divide
indicative of misalignment between the reticles.
Intellectual Property
U.S. Application No. 19/452,480, filed on January 19, 2026, and
entitled Methodology to Realize Wafer-Scale Metamaterials Components.
The Department of the Air Force may grant the prospective license
unless a timely objection is received that sufficiently shows the grant
of the license would be inconsistent with the Bayh-Dole Act or
implementing regulations. A competing application for a patent license
agreement, completed in compliance with 37 CFR 404.8 and received by
the Air Force within the period for timely objections, will be treated
as an objection and may be considered as an alternative to the proposed
license.
(Authority: 35 U.S.C. 209; 37 CFR 404)
Crystle C. Poge,
Air Force Federal Register Liaison Officer.
[FR Doc. 2026-02686 Filed 2-10-26; 8:45 am]
BILLING CODE 3911-44-P
</pre><script data-cfasync="false" src="/cdn-cgi/scripts/5c5dd728/cloudflare-static/email-decode.min.js"></script></body>
</html>This is legal information, not legal advice. Laws vary by jurisdiction and change frequently. Always verify current law with official sources and consult a licensed attorney in your jurisdiction for advice on your specific situation.